Groundbreaking Transistor Architecture Foreshadowed Microelectronics Evolution

Historical picture of the first nanowire GAAFET and the at the time (2005) graduate students Joshua Goldberger (current professor at Ohio State University), and Rong Fan (current Professor at Yale University). Allon Hochbaum (currently a professor at UC, Irvine) was not in the photo.

As the microelectronics industry moves to adopt gate-all-around transistor designs in next-generation smartphones, groundbreaking research at Berkeley Lab demonstrated an innovative approach to creating these advanced structures nearly 20 years ago.

The technology – called gate-all-around field-effect transistors (GAA-FET) – represents a key architectural advance for packing billions more transistors into the tiny microchips that are found in smartphones and laptops. The “gate-all-around” design enhances control over the transistor channel, leading to better performance and lower power consumption. While industry is now implementing GAA-FET through traditional top-down fabrication, Berkeley Lab’s early bottom-up approach showed the potential of this geometry using chemical synthesis to achieve these complex structures.

 

Read the full article here.

 

Original title: Compute This: Six Ways Berkeley Lab Is Shaping the Future of Microelectronics

Author: Theresa Duque and Alison Hatt

Link: Berkeley Lab News